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? 適用領(lǐng)域：集成電路、先進(jìn)封裝、化合物半導(dǎo)體 Relevant Industries: Integrated Circuits, Advanced Packaging, Compound Semiconductors ? 適用材料: ?Si、SiC、GaN Suitable for Processing: Silicon (Si), Silicon Carbide (SiC), Gallium Nitride (GaN) ? 晶圓尺寸：12/8 英寸 Wafer Size: 12/8 inch ? 適用工藝：氧化(Oxidation)、退火(Annealing)、固化(Polyimide)、 合金(Alloy)、擴(kuò)散(Diffusion) Applicable Processes: Oxidation, Annealing, Polyimide Curing, Alloy, Diffusion
適用領(lǐng)域：集成電路、先進(jìn)封裝 Relevant Industries: Integrated Circuits, Advanced Packaging 適用材料: ?Si Suitable for Processing: Silicon (Si) 晶圓尺寸：12/8 英寸 Wafer Size:12/8 inch 適用工藝：氮化硅(SiN)、多晶硅(Poly-Si/U-Poly/D-Poly)、 二氧化硅(TEOS)等 Applicable Processes: Silicon Nitride (SiN) Deposition, Polysilicon(Poly-Si / U-Poly /D-Poly) Deposition, Silicon Dioxide (TEOS) Deposition etc.